发明名称 FILM FOR ELECTROMAGNETIC WAVE SHIELD AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a film for an electromagnetic wave shield and the resultant film for the electromagnetic wave shield, wherein there are no deformations such as an undulation, or a ripple-shaped lateral stripe, and a high flatness appears. SOLUTION: In the method for manufacturing the film for the electromagnetic wave shield, a laminated body of a three-layer structure is composed of a metal foil 1, an ultraviolet curing resin layer 2, and a transparent plastic film 3. After an ultraviolet curing resin is coated on any one of the metal foil and the transparent plastic film, another constituent material is laminated to form the three-layer structure. Thereafter, ultraviolet rays are irradiated to cure a resin, and the laminated bodies of the three-layer structure are continuously manufactured. In this method, a substrate temperature in irradiating the ultraviolet rays is set at 40°C or less. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006319246(A) 申请公布日期 2006.11.24
申请号 JP20050142493 申请日期 2005.05.16
申请人 HITACHI CHEM CO LTD 发明人 FURUZONO KEISHIYUN;IMAIZUMI JUNICHI;TAKAHASHI HIROAKI;NAKAMURA HAJIME;HORIUCHI KOHEI
分类号 H05K9/00;B32B15/08;G09F9/00 主分类号 H05K9/00
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