| 摘要 |
<p>An exposure apparatus is provided to restrain the generation of a local defocus phenomenon and to reduce a cleaning cycle of a wafer stage table by reducing a contact area between the wafer stage table and a wafer using a plurality of protrusions. An exposure apparatus includes an illumination system for irradiating an exposure light, a reticle stage for loading a reticle, a projective optical system, and a wafer stage unit. The wafer stage unit is composed of a wafer stage capable of moving to or fro and a plurality of protrusions. The plurality of protrusions(264) are locally formed on the wafer stage in order to support stably a wafer. The plurality of protrusions are formed within a predetermined portion between a center portion and a peripheral portion of the wafer stage.</p> |
