Method of forming a tungsten layer and method of forming a semicondcutor device using the same,申请号KR20040095863-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Method of forming a tungsten layer and method of forming a semicondcutor device using the same
摘要
申请公布号	KR100648252(B1)	申请公布日期	2006.11.24
申请号	KR20040095863	申请日期	2004.11.22
申请人		发明人
分类号	H01L21/28;H01L21/205;H01L21/3205	主分类号	H01L21/28
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Shower stool or similar article

Window frame hinge member

Dispensing container for pills or the like

FRAME WITH PRINTED BOARD CONTAINER

METHOD FOR SEPARATING AND ENRICHING TRITIUM FROM HYDROGEN ISOTOPE

INTERMEDIATE HIGH-SPEED TYPE PASSENGER CONVEYOR DEVICE

WATER PURIFYING APPARATUS

APPARATUS FOR FORMING TUBULAR SLEEVES FOR APPLICATION TO BOTTLES

CHIP PACKAGE WITH HIGH CAPACITANCE, STACKED VLSI/POWER SHEETS EXTENDING THROUGH SLOTS IN SUBSTRATE

PROCESS AND APPARATUS FOR THE ANAEROBIC TREATMENT OF SEWAGE

PROCESS FOR THE PREPARATION OF SOMATOSTATIN

PROCESS FOR RECOVERING INTERFERON

POLYMERIC COMPOSITIONS FOR FOOTWEAR TREAD MEMBERS

REACTOR BLOCK, AND NUCLEAR PLANT INCLUDING SAME

SOLID-STATE COLOR IMAGING DEVICE

PRESSURE SENSITIVE ADHESIVE

LOW-VOLTAGE ELECTRIC SWITCHING SYSTEMS