发明名称 |
MASK HOLDING STRUCTURE, FILM FORMING METHOD, MANUFACTURING METHOD FOR ELECTRO-OPTIC DEVICE, AND ELECTRONIC APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a mask holding structure that suppresses warping or flection of a mask even when used on a large substrate for film formation. SOLUTION: The mask holding structure of the present invention holds the mask 1 below the bottom surface of a surface plate 4 with the substrate 5 for film formation disposed in between. The mask 1 includes a base substrate 2 having an opening 20, and a chip 3 having an opening pattern 30 aligned with the opening 20 of the base substrate 2. The surface plate 4 is provided with a magnet 7, and a plug 8 magnetically attracted by the magnet 7 is placed on the base substrate 2. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2006318834(A) |
申请公布日期 |
2006.11.24 |
申请号 |
JP20050142189 |
申请日期 |
2005.05.16 |
申请人 |
SEIKO EPSON CORP |
发明人 |
KOEDA SHUJI;YOTSUYA SHINICHI |
分类号 |
H05B33/10;C23C14/04;C23C14/24;H01L51/50 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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