发明名称 MASK HOLDING STRUCTURE, FILM FORMING METHOD, MANUFACTURING METHOD FOR ELECTRO-OPTIC DEVICE, AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a mask holding structure that suppresses warping or flection of a mask even when used on a large substrate for film formation. SOLUTION: The mask holding structure of the present invention holds the mask 1 below the bottom surface of a surface plate 4 with the substrate 5 for film formation disposed in between. The mask 1 includes a base substrate 2 having an opening 20, and a chip 3 having an opening pattern 30 aligned with the opening 20 of the base substrate 2. The surface plate 4 is provided with a magnet 7, and a plug 8 magnetically attracted by the magnet 7 is placed on the base substrate 2. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006318834(A) 申请公布日期 2006.11.24
申请号 JP20050142189 申请日期 2005.05.16
申请人 SEIKO EPSON CORP 发明人 KOEDA SHUJI;YOTSUYA SHINICHI
分类号 H05B33/10;C23C14/04;C23C14/24;H01L51/50 主分类号 H05B33/10
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