发明名称 METHOD FOR MANUFACTURING TRANSPARENT VAPOR-DEPOSITED FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a transparent vapor-deposited film which can prevent troubles of wrinkles caused by the radiation heat from a vapor deposition source and can enhance the gas shielding performance of a transparent vapor-deposited film when continuously manufacturing a plastic film having an inorganic oxide layer on at least its one side by using a vapor deposition system. SOLUTION: When continuously manufacturing the plastic film having the inorganic oxide layer on at least its one side by using the vapor deposition system, the temperature of the plastic film, onto which the inorganic oxide layer is formed, is controlled to≤25°C in advance. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006316335(A) 申请公布日期 2006.11.24
申请号 JP20050142696 申请日期 2005.05.16
申请人 TOYOBO CO LTD 发明人 IZEKI SEIJI
分类号 C23C14/56 主分类号 C23C14/56
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