| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of detecting eccentricity in a susceptor in rotation in a vapor phase deposition apparatus having the susceptor for arranging a substrate at a prescribed position. SOLUTION: The periphery of a rotating shaft 8 in the susceptor 1 is surrounded for providing a conductive eccentricity detection member 5, and it is detected whether the susceptor 1 becomes eccentric according to the presence or absence of electrical continuity caused by allowing the conductive eccentricity detection member 5 to come into contact with the rotating shaft 8 of the susceptor 1. COPYRIGHT: (C)2007,JPO&INPIT
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