| 摘要 |
<P>PROBLEM TO BE SOLVED: To arrange the linewidth of a fine pattern precisely in drawing processing by raster scan employing an optical modulation unit. <P>SOLUTION: Overlap exposure is performed while scanning the exposure area by a DMD 22 and the exposure area is exposed while overlapping along the main scanning direction. According to light intensity distribution in the feeding direction measured beforehand, an effective exposure region 22A is determined by formula (1). The effective exposure region 22A becoming the region of micromirror actually used during exposure by the DMD 22 is then defined and only the micromirror in the effective exposure region 22A is subjected to on/off switching control. On the other hand, the micromirror in the non-exposure region 22B is sustained in off state regardless of pattern data. <P>COPYRIGHT: (C)2007,JPO&INPIT |
