PATTERN FORMING METHOD AND EQUIPMENT, EQUIPMENT FOR TREATING DEVELOPER, AND METHOD FOR TREATING WASTE DEVELOPER

摘要

PROBLEM TO BE SOLVED: To provide wet treatment equipment for separating and removing residue of development well. SOLUTION: A membrane separation device 322 separates developer injected to a work subjected to exposure into developer from which residue of development is removed and concentrated developer containing residue of development. The developer is separated under such conditions as the concentrated developer is discharged by an amount substantially equal to the amount of not-yet-used developer for supplementing the developer used in development. Regenerated developer is reused as developer. The concentrated developer is separated by a centrifugal separator 323B into slurry and waste developer and treated separately. COPYRIGHT: (C)2007,JPO&INPIT