| 摘要 |
An apparatus for measuring wave front aberration and an exposure apparatus having the same are provided to precisely measure the wave front aberration by containing the control unit compensating for the interference pattern. An apparatus for measuring wave front aberration is composed of a first mask(60) specifying the light projected to a tested optical system; a second mask(70) containing a first aperture permeating the light component whose information of the wave front aberration of the tested optical system is not removed at the component of the light passed through the tested optical system, and plural apertures permeating the light component whose information of the wave front aberration of the tested optical system is removed at the component of the light passed through the tested optical system; a detecting unit for detecting the interference pattern; and a control unit(55) for compensating for the interference pattern formed by the interference between the light component passed through the first aperture and the light component passed through one aperture of the plural apertures.
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