发明名称 DRAWING EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To form a fine pattern precisely in drawing processing by raster scan using a light modulation unit. <P>SOLUTION: In a situation where an exposure area EA is irradiated with light of substantially constant intensity distribution, overlap exposure is performed according to continuous movement system and raster scanning. A DMD is arranged such that the exposure area EA inclines by a predetermined angle &alpha; against the feeding direction. The angle &alpha; is determined such that the diagonal line of the exposure area EA becomes parallel with the main scanning direction (X direction) and the exposure area EA is moved by a distance RH equal to one half of scanning band width RB along the feeding direction. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006319088(A) 申请公布日期 2006.11.24
申请号 JP20050139437 申请日期 2005.05.12
申请人 PENTAX INDUSTRIAL INSTRUMENTS CO LTD 发明人 KOBAYASHI YOSHINORI
分类号 H01L21/027;G02B26/08;G02B26/10 主分类号 H01L21/027
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