| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method useful for obtaining a hard film for cutting tools which permits high-speed and high-efficiency cutting and has more excellent abrasion resistance than TiAlN. SOLUTION: The method is for producing a hard film having a specified composition and a specified crystal structure and employs an arc ion plating process, in which arc discharge is performed by the evaporation and ionization of a metal constituting the target and in which the film formation is performed by forming magnetic lines of force which forwardly diverge in approximate crossing to the evaporation surface of the target or progress in parallel therewith, accelerating the plasmatization of a film-forming gas near the workpiece by the magnetic lines of force, and applying a bias voltage of -50 to -300 V with respect to the earth potential on the workpiece. COPYRIGHT: (C)2007,JPO&INPIT
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