发明名称 METHOD FOR FORMING FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a film, by which the liquid film having a flat surface can be formed even in any region having projections and depressions without being affected by projections and depressions of a pattern or the like formed on a substrate. SOLUTION: A liquid 13 is outputted continuously from a liquid output nozzle 11. The ratio between the projections and depressions in a fixed region on the substrate 18 to be treated is obtained. The liquid output nozzle 11 and the substrate 18 to be treated are moved relatively. The amount of the liquid 13 to be supplied to the fixed region is varied depending upon the detected ratio between the projections and depressions. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006314998(A) 申请公布日期 2006.11.24
申请号 JP20060162657 申请日期 2006.06.12
申请人 TOSHIBA CORP 发明人 ITO SHINICHI;OKUMURA KATSUYA
分类号 B05D3/00;B05D1/26;H01L21/027 主分类号 B05D3/00
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