| 摘要 |
<P>PROBLEM TO BE SOLVED: To enable a partial cleaning of only a part of a workpiece without giving bad influence on other area portions. <P>SOLUTION: A plasma cleaning apparatus comprises: a pair of counter electrodes 3 consisting of a first electrode unit 15 connected to an electric source 23 for plasma generation and a second electrode unit 17 grounded and facing with the first electrode unit 15; a process gas supply means 7 for supplying a process gas into between the counter electrodes 3; a plasma processing space 9 which is formed by the counter electrodes 3 and cleans the surface of a workpiece 11 with a plasma generated in between the counter electrodes 3; and a means 13 for moving and supporting a workpiece, by which the workpiece 11 is supported in such a state that a part of it is exposed and the exposed part of the workpiece 11 faces the plasma processing space 9 for a fixed time. <P>COPYRIGHT: (C)2007,JPO&INPIT |
