发明名称 SUBSTRATES INCLUDING A CAPPING LAYER ON ELECTRICALLY CONDUCTIVE REGIONS
摘要 A masking layer is formed on a dielectric region of an electronic device so that, during subsequent formation of a capping layer on electrically conductive regions of the electronic device that are separated by the dielectric region, the masking layer inhibits formation of capping layer material on or in the dielectric region. The capping layer can be formed selectively on the electrically conductive regions or non-selectively. Capping layer material formed over the dielectric region can subsequently be removed, thus ensuring that capping layer material is formed only on the electrically conductive regions. The capping layer can be formed using appropriate processes.
申请公布号 WO2006124131(A2) 申请公布日期 2006.11.23
申请号 WO2006US12098 申请日期 2006.04.03
申请人 INTERMOLECULAR, INC.;LAZOVSKY, DAVID, E.;MALHOTRA, SANDRA, G.;BOUSSIE, THOMAS, R.;CHIANG, TONY, P. 发明人 LAZOVSKY, DAVID, E.;MALHOTRA, SANDRA, G.;BOUSSIE, THOMAS, R.;CHIANG, TONY, P.
分类号 H01L21/76;H01L29/00 主分类号 H01L21/76
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