PHYSICAL VAPOR DEPOSITION EQUIPMENT HAVING NEUTRAL BEAM PRODUCING APPARATUS

摘要

A physical vapor deposition equipment having a neutral beam generator which has a reflector to generate a neutral beam and can apply the neutral beam to physical vapor deposition, for instance, sputtering or vacuum evaporation is provided. A physical vapor deposition equipment having a neutral beam generator comprises: a neutral beam generator comprising an ion source(10) for extracting an ion beam with polarity from gas injected through an injection port(11), a grid assembly(14) which is formed on an one side end of the ion source, and on which plural grid holes(14a) for accelerating an ion beam with a specific polarity are formed, and a reflector(40) on which plural reflector holes(42) corresponding to the grid holes of the grid assembly are formed to convert the ion beam into a neutral beam by reflecting an ion beam passing through the grid holes from the reflector holes; a reaction chamber(50) which is formed at an end of the reflector, into which gas is injected through an injection port(51), and which comprises a stage(60) capable of placing a substrate(20) to be treated on a proceeding path of the neutral beam generated from the reflector; and plural target parts for allowing sputtering to generate a flux of a reaction material to be deposited on the substrate to be treated, wherein the reflector holes of the reflector are formed in such a manner that an emitting area of a neutral beam flux emitted from the reflector is larger than an incidence area of a flux on an incidence plane in which a flux accelerated in the grid assembly is received.