METHODS OF FORMING DEVICES ASSOCIATED WITH SEMICONDUCTOR CONSTRUCTIONS
摘要
<p>The invention includes methods of forming devices associated with semiconductor constructions. In exemplary methods, common processing steps are utilized to form fully silicided recessed array access gates and partially silicided periphery transistor gates.</p>
申请公布号
WO2006124216(A1)
申请公布日期
2006.11.23
申请号
WO2006US15875
申请日期
2006.04.26
申请人
MICRON TECHNOLOGY, INC.
发明人
NEJAD, HASAN;HALLER, GORDON, A.;FIGURA, THOMAS, ARTHUR;IYER, RAVI
