发明名称 |
PROCESSING CHAMBER WITH OPTICAL WINDOW CLEANED USING PROCESS GAS |
摘要 |
An apparatus is provided including a semiconductor processing chamber enclosed by a plurality of walls. Also included is a source of process gas that is required for processing a wafer within the processing chamber. Mounted on one of the walls of the processing chamber is a window. An inlet is positioned adjacent to the window and remains in communication with the processing chamber. The inlet is further coupled to the source of process gas to channel the process gas into the chamber for both preventing the deposition of byproducts on the window and further processing the wafer within the processing chamber.
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申请公布号 |
KR20060118632(A) |
申请公布日期 |
2006.11.23 |
申请号 |
KR20067023659 |
申请日期 |
2006.11.10 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
NI TUQUIANG;COLLISON WENLI |
分类号 |
H01L21/00;H01L21/302;G01B11/00;G02B7/00;H01L21/205;H01L21/304;H01L21/3065;H01L21/31 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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