发明名称 Manufacturing Aware Deisgn and Design Aware Manufacturing
摘要 Some embodiments of the invention provide a manufacturing aware process for designing an integrated circuit ("IC") layout. The process receives a manufacturing configuration that specifies a set of manufacturing settings for a set of machines to be used to manufacture an IC based on the IC layout. The process defines a set of design rules based on the specified manufacturing configuration. The process uses the set of design rules to design the IC layout. Some embodiments of the invention provide a design aware process for manufacturing an integrated circuit ("IC"). The process receives an IC design with an associated set of design properties. The process specifies a manufacturing configuration that specifies a set of manufacturing settings for a set of machines to be used to manufacture the IC, where the specified set of manufacturing settings are based on the set of design properties. The process manufactures the IC based on the manufacturing settings.
申请公布号 US2006265679(A1) 申请公布日期 2006.11.23
申请号 US20060419495 申请日期 2006.05.20
申请人 SCHEFFER LOUIS K;FUJIMURA AKIRA 发明人 SCHEFFER LOUIS K.;FUJIMURA AKIRA
分类号 G06F17/50;G06F19/00 主分类号 G06F17/50
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