| 发明名称 |
Siloxane-based resin and a semiconductor interlayer insulating film using the same |
| 摘要 |
A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnect layers of a semiconductor device.
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| 申请公布号 |
US2006264595(A1) |
申请公布日期 |
2006.11.23 |
| 申请号 |
US20060431707 |
申请日期 |
2006.05.11 |
| 申请人 |
LYU YI Y;SONG KI Y;RYU JOON S;SEON JONG B |
发明人 |
LYU YI Y.;SONG KI Y.;RYU JOON S.;SEON JONG B. |
| 分类号 |
C08G77/50;C08L83/04;B32B17/02;B32B25/20;B32B27/00;C08G77/04;C09D183/04;C09D183/14;H01B3/46;H01L21/00;H01L21/31;H01L21/312;H01L21/469;H01L21/768;H01L23/522 |
主分类号 |
C08G77/50 |
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