发明名称 |
Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing |
摘要 |
A method of processing a workpiece includes introducing an optical absorber material precursor gas into a chamber containing the workpiece, generating an RF oscillating toroidal plasma current in a reentrant path that includes a process zone overlying the workpiece by applying RF source power, so as to deposit a layer of an optical absorber material on the workpiece, and exposing the workpiece to optical radiation that is at least partially absorbed in the optical absorber layer.
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申请公布号 |
US2006263540(A1) |
申请公布日期 |
2006.11.23 |
申请号 |
US20050131899 |
申请日期 |
2005.05.17 |
申请人 |
RAMASWAMY KARTIK;HANAWA HIROJI;GALLO BIAGIO;COLLINS KENNETH S;MA KAI;PARIHAR VIJAY;JENNINGS DEAN;MAYUR ABHILASH J;AL-BAYATI AMIR;NGUYEN ANDREW |
发明人 |
RAMASWAMY KARTIK;HANAWA HIROJI;GALLO BIAGIO;COLLINS KENNETH S.;MA KAI;PARIHAR VIJAY;JENNINGS DEAN;MAYUR ABHILASH J.;AL-BAYATI AMIR;NGUYEN ANDREW |
分类号 |
H05H1/24 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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