MATERIAL FOR PROTECTIVE FILM FORMATION FOR LIQUID IMMERSION EXPOSURE PROCESS, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME

摘要

This invention provides a material for protective film formation for a liquid immersion exposure process, suitable for use in a liquid immersion exposure process, particularly a local exposure liquid immersion process for filling a liquid immersion medium into only between an exposure lens and a substrate comprising a protective film provided on a photoresist layer, the material for protective film formation being formed on a photoresist film, wherein the material for protective film formation comprises a cyclic fluoroalkyl polyether and a fluoro organic solvent, and a method for photoresist pattern formation using the material for protective film formation.