摘要 |
A method and apparatus for cleaning contaminated surfaces, especially semiconductor wafers, using energetic cluster beams is disclosed. In this system, charged beams consisting of microdroplets or clusters having a prescribed composition, velocity, energy and size are directed onto a target substrate dislodging contaminant material. The charged, high energy cluster beams are formed by electrostatically atomizing a conductive fluid fed pneumatically to the tip of one or more capillary-like-emitters.
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申请人 |
EHD TECHNOLOGY GROUP, INC.;MAHONEY, JOHN, F.;PEREL, JULIUS;FINSTER, JAMES, K. |
发明人 |
MAHONEY, JOHN, F.;PEREL, JULIUS;FINSTER, JAMES, K. |