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发明名称
Plasma source for uniform plasma distribution in plasma chamber
摘要
申请公布号
KR100647779(B1)
申请公布日期
2006.11.23
申请号
KR20040034299
申请日期
2004.05.14
申请人
发明人
分类号
H05H1/00
主分类号
H05H1/00
代理机构
代理人
主权项
地址
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