发明名称 |
Fin field effect transistors (FinFETs) and methods for making the same |
摘要 |
In a first aspect, a first method is provided for semiconductor device manufacturing. The first method includes the steps of (1) forming a first side of a fin of a fin field effect transistor (FinFET); (2) processing the first side of the fin; and (3) forming a second side of the fin while supporting the first side of the fin. Numerous other aspects are provided.
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申请公布号 |
US2006261414(A1) |
申请公布日期 |
2006.11.23 |
申请号 |
US20050132652 |
申请日期 |
2005.05.19 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HOVIS WILLIAM P.;MANDELMAN JACK A. |
分类号 |
H01L29/76 |
主分类号 |
H01L29/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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