发明名称 Block copolymer composition for photosensitive flexographic plate
摘要 A composition for photosensitive flexographic plates which is capable of forming a sheet having a smooth surface and excellent antiflowing properties and less apt to have trouble caused by sticking and which further has excellent thin-line reproducibility; a block copolymer composition for photosensitive flexographic plates which is suitable for use in the composition; and a flexographic plate obtained by exposing the composition to light. Also provided are: a block copolymer composition containing a three-branched aromatic vinyl/conjugated diene block copolymer obtained with a specific coupling agent; and a composition for photosensitive flexographic plates which comprises an ethylenic compound and a photopolymerization initiator.
申请公布号 US2006263715(A1) 申请公布日期 2006.11.23
申请号 US20060573292 申请日期 2006.03.23
申请人 TSUBAKI HIDEMI;IKEDA SHINYA 发明人 TSUBAKI HIDEMI;IKEDA SHINYA
分类号 G03C1/00;G03F7/00;G03F7/033 主分类号 G03C1/00
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