发明名称 |
Block copolymer composition for photosensitive flexographic plate |
摘要 |
A composition for photosensitive flexographic plates which is capable of forming a sheet having a smooth surface and excellent antiflowing properties and less apt to have trouble caused by sticking and which further has excellent thin-line reproducibility; a block copolymer composition for photosensitive flexographic plates which is suitable for use in the composition; and a flexographic plate obtained by exposing the composition to light. Also provided are: a block copolymer composition containing a three-branched aromatic vinyl/conjugated diene block copolymer obtained with a specific coupling agent; and a composition for photosensitive flexographic plates which comprises an ethylenic compound and a photopolymerization initiator.
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申请公布号 |
US2006263715(A1) |
申请公布日期 |
2006.11.23 |
申请号 |
US20060573292 |
申请日期 |
2006.03.23 |
申请人 |
TSUBAKI HIDEMI;IKEDA SHINYA |
发明人 |
TSUBAKI HIDEMI;IKEDA SHINYA |
分类号 |
G03C1/00;G03F7/00;G03F7/033 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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