发明名称 Projection optical system, exposure apparatus, and device manufacturing method
摘要 A projection optical system has at least eight reflecting mirrors and is relatively compact in the radial direction. The eight reflecting mirrors (M 1 ~M 8 ) form a reduced image of a first surface on a second surface. A first reflecting image forming optical system (G 1 ) forms a first intermediate image (IMI 1 ) of the first surface based on light from the first surface, a second reflecting image forming optical system (G 2 ) forms a second intermediate image (IMI 2 ) of the first surface based on light from the first intermediate image, and a third reflecting image forming optical system (G 3 ) forms a reduced image on the second surface based on light from the second intermediate image. The number of reflecting mirrors (M 6 ~M 8 ) comprising the third reflecting image forming optical system is greater than the number of reflecting mirrors (M 1 , M 2 ) comprising the first reflecting image forming optical system.
申请公布号 US2006262277(A1) 申请公布日期 2006.11.23
申请号 US20060353005 申请日期 2006.02.14
申请人 TAKAHASHI TOMOWAKI 发明人 TAKAHASHI TOMOWAKI
分类号 G03B21/26 主分类号 G03B21/26
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