| 摘要 |
The method involves bombarding a side of a substrate with ions to implant non gaseous heavy ions in sufficient concentration for creating a micro-cavity layer in the substrate, where the layer has a gaseous phase formed by substrate component. The side of the substrate is maintained in intimate contact with a stiffener. The rupture is made in the substrate at the level of micro-cavity by applying thermal treatment and/or detachment constraints. |
