发明名称 PLASMA PROCESSING SYSTEM
摘要 <p>A plasma processing apparatus M1 is provided with a processing part 20 for supporting a pair of elongate electrodes 30. The processing part 20 is provided with a plurality of pull bolts 52 (approach-deforming preventers) mutually spacedly arranged in the longitudinal direction of the electrode 30. A head part of each pull bolt 52 is hooked on a rigid plate 33 through a bolt holder 53, and a leg part thereof is screwed in the electrode 30. Owing to this arrangement, the electrodes 30 can be prevented from being deformed by Coulomb's force. <IMAGE></p>
申请公布号 EP1448030(A4) 申请公布日期 2006.11.22
申请号 EP20030791379 申请日期 2003.08.28
申请人 SEKISUI CHEMICAL CO., LTD. 发明人 MAYUMI, SATOSHI;HINO, MAMORU;YASHIRO, SUSUMU;SHIMIZU, HARUKAZU
分类号 H05H1/24;H01J37/32;H05H1/48 主分类号 H05H1/24
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