发明名称 APPARATUS FOR TREATING FLUE GAS USING SINGLE PERFORATED TRAY
摘要 An apparatus for treating exhaust gas with a single stage gas dispersion plate is provided to increase a circulation amount of absorbing solution slurry of upper and lower parts of a gas dispersion plate by generating lowering of density of a gas-liquid mixture by supplying air for oxidation, and obtain a high sulfur dioxide removal rate by directly supplying limestone slurry to a bubble layer of the gas dispersion plate. A plurality of exhaust gas inducing plates(120) are installed in an absorbing tower(100) for inducing exhaust gas to a lower part of a gas dispersion plate(121). The gas dispersion plate has a plurality of gas injection holes(122), wherein an overflow weir(123) is integratedly formed at a circumference of an edge for overflow of an absorbing solution. An absorbing solution slurry rising pipe(124) is installed, contacting with a central lower part of the gas dispersion plate to supply absorbing solution slurry from a lower part of the gas dispersion plate to an upper part of the gas dispersion plate. A limestone slurry supply pipe(130) is connected with a central part of the absorbing solution slurry rising pipe for directly supplying limestone slurry which is an absorbing agent, to an air bubble layer of the upper part of the gas dispersion plate. An oxidation air injection pipe(140) injects air for oxidation connected with a lower part of the absorbing solution slurry rising pipe for generating air bubbles.
申请公布号 KR100651218(B1) 申请公布日期 2006.11.22
申请号 KR20050122516 申请日期 2005.12.13
申请人 KOREA ELECTRIC POWER CORPORATION 发明人 PARK, SEUNG SOO;KIM, KI HYOUNG;AN, HI SOO;PARK, KWANG KYU;EHM, HEE MOON
分类号 B01D53/50;B01D53/14 主分类号 B01D53/50
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