发明名称 |
Equipment and method for measuring silicon concentration in phosphoric acid solution |
摘要 |
<p>Disclosed is equipment for measuring a silicon concentration in a phosphoric acid solution under use as an etching solution during operation of a semiconductor substrate processing system. The equipment is provided with at least a reaction tank and a concentration-measuring tank. The reaction tank includes a reaction unit for adding hydrofluoric acid to a predetermined constant amount of the phosphoric acid solution drawn out of the semiconductor substrate processing system to form a silicon fluoride compound and then causing the silicon fluoride compound to evaporate. The concentration-measuring tank comprises a hydrolysis unit for bubbling the silicon fluoride compound, which has evaporated from the reaction tank, through deionized water to hydrolyze the silicon fluoride compound and a measurement unit for determining a change rate of silicon concentration in the deionized water subsequent to the bubbling. Also disclosed is a method for measuring a silicon concentration in a phosphoric acid solution under recirculation and use as an etching solution in a semiconductor substrate processing system in operation.</p> |
申请公布号 |
EP1724824(A2) |
申请公布日期 |
2006.11.22 |
申请号 |
EP20060009856 |
申请日期 |
2006.05.12 |
申请人 |
APPRECIA TECHNOLOGY INC. |
发明人 |
WATATSU, HARURU;IZUTA, NOBUHIKO;YATA, HIDEO |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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