发明名称 |
VIA HOLE FORMED METHOD USING LASER BEAM |
摘要 |
A method for processing a via hole using a laser beam is provided to increase productivity by processing a number of via holes collectively. A base substrate with a revealed insulation layer corresponding to a via hole pattern part is formed(S100). A via hole is formed by scanning a laser beam with an equal width to the width of the base substrate along the length direction on the base substrate(S200). The laser beam is a multi-beam where an outer part of each single beam is overlapped, in order to obtain uniform energy density over the whole width of the laser beam.
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申请公布号 |
KR100651561(B1) |
申请公布日期 |
2006.11.22 |
申请号 |
KR20050058046 |
申请日期 |
2005.06.30 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
JEUN, IL KYOON;KIM, JONG GUK |
分类号 |
H05K3/00 |
主分类号 |
H05K3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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