发明名称 VIA HOLE FORMED METHOD USING LASER BEAM
摘要 A method for processing a via hole using a laser beam is provided to increase productivity by processing a number of via holes collectively. A base substrate with a revealed insulation layer corresponding to a via hole pattern part is formed(S100). A via hole is formed by scanning a laser beam with an equal width to the width of the base substrate along the length direction on the base substrate(S200). The laser beam is a multi-beam where an outer part of each single beam is overlapped, in order to obtain uniform energy density over the whole width of the laser beam.
申请公布号 KR100651561(B1) 申请公布日期 2006.11.22
申请号 KR20050058046 申请日期 2005.06.30
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 JEUN, IL KYOON;KIM, JONG GUK
分类号 H05K3/00 主分类号 H05K3/00
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