发明名称 HEATING APPARATUS FOR MANUFACTURING OF PLASMA DISPLAY PANEL
摘要 A heat treatment apparatus used to manufacture a plasma display panel is provided to perform a heat treatment of a substrate at an optimum state by precisely controlling a transfer speed of the substrate and intensity of light. A heat treatment apparatus includes a transfer unit(604) transferring a substrate, and a focusing light irradiating unit(606) irradiating light onto the substrate. The focusing light irradiating unit controls intensity of the light according to a profile of firing temperature set for each firing step. The transfer unit controls a transfer speed of the substrate according to the profile of firing temperature set for each firing step.
申请公布号 KR20060117794(A) 申请公布日期 2006.11.17
申请号 KR20050040337 申请日期 2005.05.13
申请人 LG ELECTRONICS INC. 发明人 KIM, TAE YONG;PARK, BUM CHAN
分类号 H01J11/20;G02F1/13 主分类号 H01J11/20
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