发明名称 |
HEATING APPARATUS FOR MANUFACTURING OF PLASMA DISPLAY PANEL |
摘要 |
A heat treatment apparatus used to manufacture a plasma display panel is provided to perform a heat treatment of a substrate at an optimum state by precisely controlling a transfer speed of the substrate and intensity of light. A heat treatment apparatus includes a transfer unit(604) transferring a substrate, and a focusing light irradiating unit(606) irradiating light onto the substrate. The focusing light irradiating unit controls intensity of the light according to a profile of firing temperature set for each firing step. The transfer unit controls a transfer speed of the substrate according to the profile of firing temperature set for each firing step.
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申请公布号 |
KR20060117794(A) |
申请公布日期 |
2006.11.17 |
申请号 |
KR20050040337 |
申请日期 |
2005.05.13 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
KIM, TAE YONG;PARK, BUM CHAN |
分类号 |
H01J11/20;G02F1/13 |
主分类号 |
H01J11/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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