| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide Model Based Optical Proximity Correction (MOPC) biasing techniques for optimizing a mask pattern, which takes into account the influence of neighboring features with respect to the mask. <P>SOLUTION: A predicted pattern is generated from a target pattern (S501), and a plurality of evaluation points at which biasing is determined are selected (S502). Next, a set of multivariable equations are generated for each evaluation point (S506). Each equation represents the influence from neighboring features on a mask. The equations are solved, to determine that amount of bias at each evaluation point (S512), and the mask is optimized accordingly. By repeating this process, the mask pattern is further optimized. <P>COPYRIGHT: (C)2007,JPO&INPIT |
