| 摘要 |
A method for forming a high resolution pattern is provided to reduce remarkably fabrication costs and to simplify manufacturing processes by using a direct patterning manner. A sacrificial layer(30) made of a first material is formed on a substrate(10). A pattern groove is formed on the resultant structure by performing a direct patterning process on the sacrificial layer. The pattern groove has a CD(Critical Dimension) with a first resolution. A second material is filled in the pattern groove in a second resolution range. Then, the remaining sacrificial layer is eliminated from the resultant structure.
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