| 发明名称 |
THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREFOR, INTEGRATED CIRCUIT, AND LIQUID CRYSTAL DISPLAY |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a contact hole which penetrates resist completely. <P>SOLUTION: Any manufacturing method for a thin film transistor comprises the steps of irradiating light from an optical source at resist on a glass substrate through a mask, developing the resist, and forming a contact hole in the resist. For the light, i line is used. <P>COPYRIGHT: (C)2007,JPO&INPIT |
| 申请公布号 |
JP2006313879(A) |
申请公布日期 |
2006.11.16 |
| 申请号 |
JP20060076937 |
申请日期 |
2006.03.20 |
| 申请人 |
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO LTD |
发明人 |
YAMAGUCHI HIROTAKA;MATSUMURA MASAKIYO |
| 分类号 |
H01L21/027;G03F1/00;G03F1/70;G03F7/20;H01L21/28;H01L21/336;H01L21/768;H01L29/786 |
主分类号 |
H01L21/027 |
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