发明名称 Semiconductor memory device and method of manufacturing the same
摘要 A method of manufacturing a semiconductor memory device is provided. The method includes: providing a semiconductor substrate, forming a cell transistor on the semiconductor substrate, and forming a SiON layer with a refractive index of about 1.8 or less on the cell transistor.
申请公布号 US2006258099(A1) 申请公布日期 2006.11.16
申请号 US20060432118 申请日期 2006.05.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE EUHN-GI;JANG BONG-JUN;YUN SUNG-WOON
分类号 H01L21/336 主分类号 H01L21/336
代理机构 代理人
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