发明名称 Sample processing focused ion beam system for e.g. defect analysis of semiconductor device, has output area fixing settings to data output, and control area controlling condensers, electrodes and lens based on data about settings
摘要 <p>The system has a computer unit (16) selecting optical settings for condensers (8), changeable openings, beam deflection electrodes (11) and objective lenses (12) on the basis of data entered into an input device. A data output area is provided for fixing the settings to a data output. A control area controls the condensers, electrodes, openings and the lens based on the data about the settings output by the output area.</p>
申请公布号 DE102006018942(A1) 申请公布日期 2006.11.16
申请号 DE20061018942 申请日期 2006.04.24
申请人 JEOL LTD. 发明人 MATSUBA, MASAHIRO
分类号 H01J37/304;H01J37/305 主分类号 H01J37/304
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