发明名称 |
System and method for photolithography in semiconductor manufacturing |
摘要 |
A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a reference focus plane of a second mask of the one or more masks; and determining the best focus for the second mask based on the best focus of the first mask and the Z direction difference of the first and second masks, using the reference focus planes of the first and second masks.
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申请公布号 |
US2006257765(A1) |
申请公布日期 |
2006.11.16 |
申请号 |
US20050129968 |
申请日期 |
2005.05.16 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
SU WEI-YU;DAI YI-MING;LIAO CHI-HUNG;KUNG CHUN-HUNG |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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