POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

Disclosed is a positive resist composition for manufacturing an MEMS by using an electron beam. This positive resist composition contains a resin component (A) whose alkali solubility is increased by the action of an acid, and an acid generator component (B) which generates an acid when irradiated with radiation. The resin component (A) is composed of a resin which is obtained by protecting a part of all the hydroxyl groups in an alkali-soluble novolac resin with an acid-cleavable dissolution inhibiting group.