发明名称 NITRIDE SEMICONDUCTOR ELEMENT AND PRODUCTION METHOD THEREFOR
摘要 <p>A nitride semiconductor element having a structure of improving the crystallinity of a growing nitride semiconductor and capable of very easy peeling off and chip-forming of a substrate, and a production method therefor. When a nitride semiconductor element in which nitride semiconductor layers are laid on a substrate (1) is formed, the substrate consists of Mg&lt;SUB&gt;x&lt;/SUB&gt;Zn&lt;SUB&gt;1-x&lt;/SUB&gt;O (0&lt;x=0.5), a first nitride semiconductor layer (2) consisting of In&lt;SUB&gt;y&lt;/SUB&gt;Ga&lt;SUB&gt;1-y&lt;/SUB&gt;N (0=y=0.5) is provided in contact with the substrate, and nitride semiconductor layers (3)-(7) are placed on the first nitride semiconductor layer so as to form the semiconductor element.</p>
申请公布号 WO2006121000(A1) 申请公布日期 2006.11.16
申请号 WO2006JP309242 申请日期 2006.05.08
申请人 ROHM CO., LTD.;NAKAHARA, KEN 发明人 NAKAHARA, KEN
分类号 H01L21/205;H01L21/338;H01L29/26;H01L29/778;H01L29/812;H01L33/06;H01L33/10;H01L33/22;H01L33/28;H01L33/32;H01S5/323 主分类号 H01L21/205
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