发明名称 |
NITRIDE SEMICONDUCTOR ELEMENT AND PRODUCTION METHOD THEREFOR |
摘要 |
<p>A nitride semiconductor element having a structure of improving the crystallinity of a growing nitride semiconductor and capable of very easy peeling off and chip-forming of a substrate, and a production method therefor. When a nitride semiconductor element in which nitride semiconductor layers are laid on a substrate (1) is formed, the substrate consists of Mg<SUB>x</SUB>Zn<SUB>1-x</SUB>O (0<x=0.5), a first nitride semiconductor layer (2) consisting of In<SUB>y</SUB>Ga<SUB>1-y</SUB>N (0=y=0.5) is provided in contact with the substrate, and nitride semiconductor layers (3)-(7) are placed on the first nitride semiconductor layer so as to form the semiconductor element.</p> |
申请公布号 |
WO2006121000(A1) |
申请公布日期 |
2006.11.16 |
申请号 |
WO2006JP309242 |
申请日期 |
2006.05.08 |
申请人 |
ROHM CO., LTD.;NAKAHARA, KEN |
发明人 |
NAKAHARA, KEN |
分类号 |
H01L21/205;H01L21/338;H01L29/26;H01L29/778;H01L29/812;H01L33/06;H01L33/10;H01L33/22;H01L33/28;H01L33/32;H01S5/323 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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