发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a high reliability semiconductor device. SOLUTION: The method comprises a step of forming trenches 26 in a first surface 24 of a semiconductor substrate 2 having a plurality of integrated circuit elements 10 without overlapping with the plurality of integrated circuit elements 10, pasting a holder 32 onto the first surface 24 of the substrate 2, and cutting the semiconductor substrate 2 by a blade 30 so that the blade 30 pierces trenches 26 from a second surface 38 opposite to the first surface 24 but not reaches the first surface 24 without touching the holder 32. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006313831(A) 申请公布日期 2006.11.16
申请号 JP20050135996 申请日期 2005.05.09
申请人 SEIKO EPSON CORP 发明人 SATO SHINGO
分类号 H01L21/301 主分类号 H01L21/301
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