发明名称 PHASE TRANSFORMATION MEMORY ELEMENT AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a phase transformation memory element by which power consumption required for the phase transformation of a phase transformation film is minimized by minimizing a contact area of a current impression part brought into contact with the phase transformation film. <P>SOLUTION: A phase transformation memory element comprises a lower structure having a contact plug 27, a nanowire 28 formed by extending from the surface of the contact plug 27 to the inside of the contact plug 27, and the phase transformation film 29 formed on the contact plug 27. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006313912(A) 申请公布日期 2006.11.16
申请号 JP20060128947 申请日期 2006.05.08
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 CHOI CHEL-JONG;PARK SHOHO;KIM TAE-GYU;LEE DONG-WOO
分类号 H01L27/105;H01L45/00 主分类号 H01L27/105
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