| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a periphery exposure device which is provided with a high processing capacity for a substrate while suppressing the enlargement of the device, and a periphery exposing method. <P>SOLUTION: The periphery exposure device is constituted so as to be provided with first and second optical path forming members whose end sides are arranged in the path of light beams so that the light beams are divided when the beams are seen at sectional planes of the light beams from a light source; a first mounting table constituted so as to be turnable about a vertical axis while mounting the substrate thereon, and peripheral parts of the substrate are positioned in the irradiating region of light beams from the tip end side of the first optical path forming member; a second mounting table constituted so as to be turnable about a vertical axis while mounting the substrate thereon, and the peripheral parts of the substrate are positioned in the irradiating region of light beams from the tip end side of the second optical path forming member; and a light shielding means for shielding the irradiation of respective light from the first and second optical path forming members. Peripheral rim exposure can be effected simultaneously with respect to the substrates on the first and second mounting tables employing a common light source whereby a high processing capacity is obtained and the enlargement of the device can be suppressed. <P>COPYRIGHT: (C)2007,JPO&INPIT |
