发明名称 Vertical diode, matrix position sensitive apparatus and manufacturing method of the same
摘要 A vertical diode formed by stacking semiconductor layers includes (1) a lower electrode whose surface is plasma-treated in a gas containing an element which becomes a P-type or N-type conductivity type, and (2) a non-doped semiconductor layer provided on the lower electrode. The P-type or N-type semiconductor area is formed in a contact surface of the non-doped semiconductor layer in contact with the plasma-treated surface of the lower electrode.
申请公布号 US2006258080(A1) 申请公布日期 2006.11.16
申请号 US20060430896 申请日期 2006.05.10
申请人 NEC LCD TECHNOLOGIES, LTD. 发明人 TAKAHASHI MITSUASA
分类号 H01L21/8238;H01L23/58 主分类号 H01L21/8238
代理机构 代理人
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