Exposure apparatus and method for reducing thermal deformity of reticles

摘要

Disclosed is an exposure apparatus and method thereof able to prevent thermal deformity of reticles. The exposure apparatus may includes a reticle container including a plurality of reticles and a reticle stage on which an exposing process is carried. A method for exposing a substrate may include transferring a first reticle to a reticle container having a plurality of slots and transferring the first reticle from one of the plurality of slots to a reticle stage, and controlling temperature of one of the plurality of slots to be set to the saturation temperature of the first reticle.