发明名称 |
HIGH-PURITY ACETONITRILE AND PROCESS FOR PRODUCING THE SAME |
摘要 |
<p>A process for producing high-purity acetonitrile having a low absorbance at a wavelength of 200 nm. It requires a reduced amount of energy for purification and the purification step is simple. It considerably diminishes the propionitrile contained in acetonitrile. The process for high-purity acetonitrile production is characterized by mixing hydrous crude acetonitrile with an alkali, separating the mixture into an acetonitrile phase and an aqueous phase, removing the aqueous phase, subjecting the resultant acetonitrile phase to a distillation step to obtain purified acetonitrile, and passing the resultant purified acetonitrile through an cation-exchange resin to obtain high-purity acetonitrile.</p> |
申请公布号 |
WO2006121081(A1) |
申请公布日期 |
2006.11.16 |
申请号 |
WO2006JP309407 |
申请日期 |
2006.05.10 |
申请人 |
ASAHI KASEI CHEMICALS CORPORATION;SANO, KAZUHIKO;OHYAMA, KIKUO;HINAGO, HIDENORI |
发明人 |
SANO, KAZUHIKO;OHYAMA, KIKUO;HINAGO, HIDENORI |
分类号 |
C07C253/34;C07C255/03 |
主分类号 |
C07C253/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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