发明名称 HIGH-PURITY ACETONITRILE AND PROCESS FOR PRODUCING THE SAME
摘要 <p>A process for producing high-purity acetonitrile having a low absorbance at a wavelength of 200 nm. It requires a reduced amount of energy for purification and the purification step is simple. It considerably diminishes the propionitrile contained in acetonitrile. The process for high-purity acetonitrile production is characterized by mixing hydrous crude acetonitrile with an alkali, separating the mixture into an acetonitrile phase and an aqueous phase, removing the aqueous phase, subjecting the resultant acetonitrile phase to a distillation step to obtain purified acetonitrile, and passing the resultant purified acetonitrile through an cation-exchange resin to obtain high-purity acetonitrile.</p>
申请公布号 WO2006121081(A1) 申请公布日期 2006.11.16
申请号 WO2006JP309407 申请日期 2006.05.10
申请人 ASAHI KASEI CHEMICALS CORPORATION;SANO, KAZUHIKO;OHYAMA, KIKUO;HINAGO, HIDENORI 发明人 SANO, KAZUHIKO;OHYAMA, KIKUO;HINAGO, HIDENORI
分类号 C07C253/34;C07C255/03 主分类号 C07C253/34
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