RETICLE ALIGNMENT AND OVERLAY FOR MULTIPLE RETICLE PROCESS

摘要

A method for generating a plurality of reticle layouts is provided. A feature layout with a feature layout pitch is received. A plurality of reticle layouts are generated from the feature layout where each reticle layout of the plurality of reticle layouts has a reticle layout pitch and where each reticle layout pitch is at least twice the feature layout pitch.