PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD

摘要

A range wherein a liquid (immersion liquid) exists is reduced in an image space, for instance, in a catadioptric and off-axis field type immersion projection optical system. The projection optical system which projects a reduced image, which is on a first plane, on a second plane through the liquid is provided with a refracting optical element (Lp) arranged closest to the second plane. A projection plane (Lpb) of the refracting optical element has a substantially symmetrical shape with regard to two axis line directions (X direction and Y direction) orthogonally intersecting on the second plane, and substantially matches with a center axis line (40a) of a circle (40) which corresponds to a center axis line (Lpba) of the projection plane and an outer circumference of an incidence plane (Lpa) of the refracting optical element. The center axis line of the projection plane is decentered from an optical axis (AX) along the one axis line direction (Y direction) of the two axis line directions.