发明名称 METHOD FOR PRODUCING Ga2O3-BASED CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a Ga<SB>2</SB>O<SB>3</SB>-based crystal whose cleavage property is weakened and whose workability can be enhanced. SOLUTION: Aβ-Ga<SB>2</SB>O<SB>3</SB>single crystal 25 is produced by an EFG method where the (001) face of a seed crystal 20 is the growing face of a substrate and where a parallel direction to the c axis of the seed crystal 20 is a growing direction. As the cleavage property of the faces of (100) and (001) is improved, workability for cutting and the like in an LED element producing step can be enhanced and then the mass productivity of the substrate and an LED element can be increased. The superior crystal growth of a GaN-based semiconductor at the (100) face in a GaN-based LED element producing step can be obtained. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006312571(A) 申请公布日期 2006.11.16
申请号 JP20050136276 申请日期 2005.05.09
申请人 KOHA CO LTD 发明人 AOKI KAZUO;SHIMAMURA SEISHI;GARCIA VILLORA ENCARNACION ANTONIA
分类号 C30B29/16;C30B15/34;C30B15/36 主分类号 C30B29/16
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