| 摘要 |
PROBLEM TO BE SOLVED: To raise the precision of structural analysis of evaluation patterns by making a thin filmlike evaluation sample surely contain the evaluation patterns, and moreover thinning the membrane of the evaluation sample. SOLUTION: This semiconductor device 100 is a device wherein a plurality of evaluation patterns 104 are formed in a row on a substrate, from which a filmlike evaluation sample 102 vertical to the substrate is cut off so as to contain each evaluation pattern 104, and is used for observing a cross section of each evaluation pattern 104. The device is configured so that the direction of arrangement of each evaluation pattern 104 deviates from the direction of extending of the evaluation sample 102. COPYRIGHT: (C)2007,JPO&INPIT
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